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Photo Mask Inspection & Cleaner
  • Used to remove and inspect attached defect when storing and using photo mask in the Fab
  • Plasma-based technology compared to conventional chemical cleaning (WET) technology, eco-friendly with no chemicals
  • Applying automatic feed stop to prevent the breakage of the photo mask by operator
  • Reduced cleaning time contributes to improved exposure equipment productivity
  • Reduce costs by eliminating chemicals and repairing without removing
  • Improved cleaning ability compared to WET equipment by applying plasma + N2 pressure cleaning function
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